| 摘要 |
<p>PURPOSE:To prevent the inspection error due to positional discrepancy, expansion/contraction, etc., by detecting the deviation between measured pattern data and reference pattern data to determine a correction quantity and discriminating defects in the state where both patterns are matched to each other. CONSTITUTION:A measured pattern Mx in the X direction or the like which is read out from a mask pattern on a two-dimensionally moved table and a reference pattern Bx in the X direction or the like which is read out from the memory and has gate signals Gx near rise and fall parts based on + and - designed patterns are processed in a subtractor 21a of a deviation detecting circuit. Data is transmitted through a gate circuit 22a, which is operated in accordance with signals Gx, as it is in case of the rise part, and the subtraction result is inverted in the circuit 22a in case of the fall part, and a pattern deviation quantity in the X direction or the like is determined in an accumulator 23a. This deviation quantity is used as the correction quantity, and reading- out of designed patterns from the memory is so controlled that the deviation quantity is zero, and defects of the pattern are discriminated in the state where both patterns are matched to each other. Consequently, the pattern inspection of less error is performed surely without the influence of positional discrepancy, expansion/contraction, etc.</p> |
