| 摘要 |
PURPOSE:To enable to laminate a plurality of thin film patterns in an accurate manner by a method wherein a substrate and a thin film pattern forming mask are superposed, and a sprocket with which said substrate and the mask will be continuously travelled is provided. CONSTITUTION:The long-sized substrate 11, having a sprocket hole, travels continuously in a first film-forming vessel 18, second film-forming vessel 26 and a third film-forming vessel 35 at the prescribed speed in the direction shown by the arrow A using first, second and third driving sprockets 20, 28 and 37. At the same time, in the position corresponding to the first film-forming vessel 18, second film-forming vessel 26 and the third film-forming vessel 35, a lower electrode forming mask 13 whereon a sprocket hole is formed, a mask 22 for formation of an a-Si film and an upper electrode forming mask 30 are superposed on the first, second the third driving sprockets 20, 28 and 37 respectively, they are driven in an interlocked manner in the direction shown by the arrow A, thereby enabling to laminate the lower electrode, the thin film patterns of the a-Si layer and the upper electrode on the substrate 11 successively. |
