发明名称 A gate controlled semiconductor device.
摘要 <p>A gate controlled semiconductor device comprises a semiconductor element (1) of a wafer of semiconductor material having four layers P1, N1, P2, N2) of alternate conductivity types defining three series arranged junctions, a cathode electrode divided into a plurality of cathode electrode assemblies (K) including a metallic layer (11) deposited on a cathode-emitter layer (5), formed on a surface of said semiconductor element (1), an anode electrode assembly (A), at least one gate electrode assembly (G1, G2) for supplying an OFF signal to said semiconductor element (1) and impedance adjusting means for changing the turn-off time of the main current of said semiconductor element (1) and for equalizing the impedance of current paths between at least one drain (9, 18) of said gate assembly (G1, G2) and said cathode-emitter layer (5).</p>
申请公布号 EP0108273(A2) 申请公布日期 1984.05.16
申请号 EP19830110092 申请日期 1979.08.20
申请人 KABUSHIKI KAISHA MEIDENSHA 发明人 SUEOKA, TETSURO;ISHIBASHI, SATOSHI
分类号 H01L29/08;H01L29/10;H01L29/423;H01L29/74;H01L29/744;(IPC1-7):01L29/743;01L29/60 主分类号 H01L29/08
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