发明名称 MICROWAVE PROCESSING APPARATUS
摘要 PURPOSE:To realize stable and various kinds of processings without deterioration of microwave power supply and reduction in size and automatic operation by absorbing reflected wave with an artificial load being provided. CONSTITUTION:A microwave generated by a magnetron 11 propagates within a waveguide 12 and is sent to a processing chamber 14 through a dielectric transmiting window 13. This microwave heats a semiconductor substrate 16 supplied by a transfer device 15 and is sent to an artificial load 17 provided at the lower part of processing chamber 14. The artificial load 17 is structured like a casing and is secured to the processing chamber 14 by the backing seal through a quartz window 18. For the artificial load 17, water is used as the dummy material while the water supply and outlet ports 19, 20 are provided at the side wall of the casing. Thereby, water is always supplied and drained. The microwave having transmitted the quartz window 18 induces dielectric loss in the water as the dielectric material and a field energy is consumed. Namely, stable heat processing becomes possible for configurating the artificial load 17 which absorbes reflected wave. This load can also be used as the effective artificial load for etching or sputtering by plasma.
申请公布号 JPS5984526(A) 申请公布日期 1984.05.16
申请号 JP19820195524 申请日期 1982.11.08
申请人 FUJITSU KK 发明人 YANO HIROSHI;FUJIMURA SHIYUUZOU;MORIMOTO YOUJI
分类号 H01L21/302;H01J37/32;H01L21/3065 主分类号 H01L21/302
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