| 摘要 |
PURPOSE:To improve reproducibility and resolution of development by utilizing a mixture of ethylcellosolve and good solvent of resist as the developer for resist made of the polystylene derivative. CONSTITUTION:The chlorinated methylpolystyrene having average molecular weight of 110,000 is applied on the chromium mask blank and it is then heat- processed under the nitrogen ambient. A figure is delineated by electron beam with irradiation intensity of 1 micrl coulone/cm<2> using an electron beam exposing apparatus. This figure is developed by spraying of the mixed solution of cyclohexanone and ethylcellosolve with the capacitance ratio of 1:5 using the spray developer. It is then rinsed by spraying ethylcellosolve and finally it is also rinsed additionally by spraying the isopropy-lalcohol. After the development and rinse, nitrogen is sprayed and it is dried up while the mask is rotated at a rate as high as 2,000 r.p.m. |
