发明名称 FORMATION OF RESIST IMAGE
摘要 PURPOSE:To form a resist image having a fine shape and improved resolution by developing a resist made of a polymer contg. aromatic rings or a resist made of a mixture of the polymer with a cross-linking agent using a specified developer. CONSTITUTION:A polymer film made of a polymer contg. aromatic rings or of a mixture of the polymer with a cross-linking agent is formed on a substrate, and it is irradiated with radiant rays such as electron beams, X-rays, ultraviolet rays or deep ultraviolet rays or corpuscular radiation such as ion beams or neutron beams to form a latent image. When the latent image is developed, a soln. contg. dimethylformamide is used as a developer. The developer is suitable for use in the development of a vinylnaphthalene polymer, and it produces a significant effect on a mixture of the polymer with a diazide cross-linking agent. The resist can be thoroughly developed without causing excessive swelling, and a resist image having a fine shape and practically improved resolution can be formed.
申请公布号 JPS5983159(A) 申请公布日期 1984.05.14
申请号 JP19820193175 申请日期 1982.11.02
申请人 NIPPON DENKI KK 发明人 TANIGAKI KATSUMI;OONISHI YOSHITAKE
分类号 G03F7/038;G03F7/32 主分类号 G03F7/038
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