| 摘要 |
PURPOSE:To enable lithography accurately at an aimed position even when the plane mirror of a laser interference measuring instrument is strained by obtaining an error on measurement from the correct position of a measuring instrument, previously memorizing the error on a computer system and compensating the position of a sample base every time the device is moved to the aimed position. CONSTITUTION:Electron beams 2 projected from an electron gun are controlled into a desired shape and current density by diaphragms 3, 6, 8 and electron lenses 4, 7, 9, and irradiated onto a sample 11. On the other hand, a pattern data lithographed on the sample 11 is read from an external memory 15 by a CPU 16, and further transferred to a lithography control system 18. The lithography control system 18 transfers the information of the position of irradiation over a deflection control system 19 and the ON-OFF information of the electron beams 2 over a blanking control system 17, and a pattern is formed on the sample 11 by controlling a deflecting instrument 10 and a beam blanker 5. When a large pattern data is lithographed, the sample base 12 is moved simultaneously, the aimed position is transmitted over a sample base control system 20 from the CPU 16, and a difference section between a present position and the aimed position is transmitted over a motor driving system 21 as the data of the quantity of movement from the laser interference measuring system 14. |
