发明名称 Photographic light-sensitive silver halide material, containing silver halide grains, and process for preparing the silver halide grains
摘要 The invention relates to a photographic light-sensitive silver halide material with at least one light-sensitive silver halide emulsion layer, containing silver halide grains which are formed in the presence of a polymer compound of the general formula (I): <IMAGE> in which the radicals R<1>, L and X are as defined in the claims. The silver halide grains formed in the presence of the polymer compound according to the invention have a regular crystal shape and a narrow grain size distribution and can be formed at a low pAg value. In addition, the invention relates to the preparation of the silver halide grains.
申请公布号 DE3340571(A1) 申请公布日期 1984.05.10
申请号 DE19833340571 申请日期 1983.11.09
申请人 FUJI PHOTO FILM CO.,LTD. 发明人 URABE,SHIGEHARU;HEKI,TATSUO;KOJIMA,TETSURO
分类号 G03C1/015;C07D487/04;C08F12/00;C08F12/26;C08F16/14;C08F20/00;C08F20/34;C08F20/52;C08F216/14;C08F220/36;C08F220/60;G03C1/005;G03C1/04;G03C1/053;(IPC1-7):G03C1/04;C08F116/10;C08F116/12;C08F120/26;C08F120/34;C08F120/60 主分类号 G03C1/015
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