发明名称 LITHOGRAPHIC PROCESS USING A PROCESSING LAYER CONTAINING A CHALCOGENIDE GLASS AND A SURFACE AMOUNT OF SOURCE-METAL CONTAINING MATERIAL
摘要 <p>TAI, K. L. 2 LITHOGRAPHIC PROCESS AND RESULTING ARTICLE Lithographic fabrication of LSI's depends on inorganic resist to yield excellent edge acuity. Systems depend upon photomigration--of, e.g., silver--into a chalcogenide or other glass layer to insolubilize irradiated regions with respect to solvent development. Regulation of silver content and control of processing conditions result in a surface concentration gradient and concomitant lateral diffusion of silver to account for enhanced acuity.</p>
申请公布号 CA1166879(A) 申请公布日期 1984.05.08
申请号 CA19810377556 申请日期 1981.05.14
申请人 WESTERN ELECTRIC COMPANY, INCORPORATED 发明人 TAI, KING L.
分类号 H01L21/027;B41M5/00;G03F7/004;(IPC1-7):G03C1/72;G03C5/00 主分类号 H01L21/027
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