发明名称 INFRARED RAY INSPECTING ELEMENT
摘要 PURPOSE:To obtain a stable infrared-ray inspecting element by providing an reverse conductive region formed in an island shape and an oxide film of substrate crystal on the surface of an Hg-Cd-Te substrate having minus conduction type and covering an exposed part of P-N junction of the substrate and the reverse conductive region with the oxide film. CONSTITUTION:After forming a native oxide film 2 in <=100Angstrom thickness by oxidizing an Hg-Cd-Te substrate 1 having minus conduction type, the film is removed selectively to provide an opening hole 3. Then an SiO2 film 4 is formed insulating film on the substrate 1 containing the film 2 and a larger opening hole 5 than the hole 3 is formed on the film 4 at the part of the hole 3. Then (n) type impurities are introduced with the film 4 as a master to the region opposing to the hole 5 of the substrate 1 to form an (n) type region 6 on the (p) type substrate surface. Thereby, the exposed part of an P-N junction 7 of the substrate 1 is covered by the film 2 to intercept the outer air. A prescribed electrode 8 is formed to obtain an infrared-ray inspecting element. Thus, the element of low leakage current and having stable performance for long term can be obtained in good yeild.
申请公布号 JPS5979126(A) 申请公布日期 1984.05.08
申请号 JP19820189574 申请日期 1982.10.27
申请人 FUJITSU KK 发明人 ITOU MAKOTO;HAMASHIMA SHIGEKI;IMAI SOUICHI
分类号 G01J5/02;G01J5/28;H01L31/103 主分类号 G01J5/02
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