发明名称 APERTURE MASK FOR BEAM SHAPING
摘要 PURPOSE:To obtain a mask to be proof against large heat input by composing an aperture mask for beam shaping used for an electron beam exposure device out of plate materials having knife edges consisting of two ground planes or two planes including replica plane of ground plane with laminating those plates plurally to form desired aperture with a portion surrounded by the edges. CONSTITUTION:A prism core material of high-strength aluminum 1 is applied with mirror grinding only for one surface 1a and copper plating 2 for peripheral surface which is removed partly for finishing of the shape. Next, the core material 1 is sliced with inclination to obtain plural plate materials 31-33 one side of which are ground and immersed into dilute hydrochloric acid so as to melt the core material. After that, a ground surface of the residual copper plating is deposited with high-melting-point metal such as Mo, W, Ta by vacuum deposition to produce knife edge composed of one ground plane and a replica plane of ground plane having a rectangular opening at a center. Thus the laminated plural plate materials form an aperture surrounded by the edges 41-43.
申请公布号 JPS5979523(A) 申请公布日期 1984.05.08
申请号 JP19820190102 申请日期 1982.10.29
申请人 TOSHIBA KK 发明人 NAKASUJI MAMORU
分类号 H01L21/027;H01J37/09;(IPC1-7):01L21/30 主分类号 H01L21/027
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