| 摘要 |
PURPOSE:To prevent a temperature rise of a sample due to thermal radiation from an objective lens by disposing a radiator plate fast stuck to the back of the sample, pushing the surface of the sample against a reference surface by an elastic member and lowering contact thermal resistance with a cassette proper. CONSTITUTION:The radiator plate 4 is brought into contact with the back of the sample (a mask substrate) 3 and encased in the cassette proper 1, the radiator plate 4 and the sample 3 are pushed up by the elastic members 5 between the radiator plate and a back cover 2, and the surface of the sample is pushed against pins 6 for positioning. The sample 3 is made of glass, etc., and the radiator plate 4, the cassette proper 1, the cover 2 and the elastic members 5 are made of a metal. According to the constitution, contact thermal resistance between the sample 3 and the cassette proper 1 can be reduced extremely, the temperature rise of the sample 3 due to thermal radiation from the objective of an electron beam drawing device is inhibited, the deformation of the sample 3 can be prevented, and the accuracy of the position of drawing can be improved. |
