发明名称 Solid photoresist and method of making photoresist
摘要 A process for making printed circuit boards and the like including laminating a layer of a solid nonsensitized photoresist material onto a substrate producing a product suitable for indefinite storage under any light condition. A process including the further steps of sensitizing the solid photoresist material by wetting with a liquid sensitizer, drying the sensitized photoresist material, and then following the conventional exposure, developing and etching steps.
申请公布号 US4447519(A) 申请公布日期 1984.05.08
申请号 US19830509589 申请日期 1983.06.29
申请人 PRITIKIN, NATHAN 发明人 PRITIKIN, NATHAN
分类号 G03F7/16;H05K3/02;H05K3/06;(IPC1-7):G03C1/76 主分类号 G03F7/16
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