| 摘要 |
<p>PURPOSE:To obtain a color filter with excellent spectral characteristics in a simple process by laminating a colored layer on a solid-state image pickup element by the vapor deposition of dye, etc., forming a pattern by using photoresist, and performing a etching treatment except at the colored layer. CONSTITUTION:The solid-state image pickup element is fixed in a vacuum deposition device and dye, pigment, or coloring matter is put in a port for vacuum deposition of tantalum, etc., and heated at 100-500 deg.C under about 10<-3>- 10<-10>Torr pressure to form the colored layer on the image pickup element. The photoresist is applied thereupon and prebaked at 40-80 deg.C for 10-30min and exposure to ultraviolet rays is performed through a shadow mask. Then, the colored layer of the color filter is formed by development, rinsing, postbaking of 80-150 deg.C and 10-60min, and etching. Further, a high polymer material is applied thereupon to form a transparent protection layer and then said operations are repeated to form a dischromatic or trichromatic filter. The colored layer is 0.05-2mum thick.</p> |
