| 摘要 |
PURPOSE:To perform etching under optimum conditions by providing a mechanism for detecting condition of objects to be etched in the midway where said objects are etched and controlling the rate of the etchant to be ejected thereafter according to the result of said detection. CONSTITUTION:An etching machine is provided with an etching chamber 1, ejection nozzles 3 for an etchant divided to the four groups; the top and bottom on the side where objects 4 to be etched enter and the top and bottom on the side where said objects emerge, a mechanism 5 for moving the objects 4 in an arrow direction in the chamber 1, and a mechanism for controlling the rate of the etchant to be ejected from the nozzles 3. A copper foil thickness gauge 6 which detects the etching condition of the objects 4 in the midway where the objects 4 are etched is provided, and the rate of the etchant to be ejected from the nozzles 3 of the prescribed group is controlled according to the results of the detection. |
