| 发明名称 |
PHOTORESIST DEVELOPER INCLUDING AN ALKALI METAL HYDROXIDE AND A CHELATING AGENT FOR ALUMINIUM ION |
| 摘要 |
<p>A developing solution for use with imaging film comprising a photoresist layer over an aluminum coated substrate and the process of developing the film are shown to be rapid acting. The developing solution comprises an aqueous solution having a pH of at least 12.5 of an alkali metal hydroxide and a chelating agent having a stability constant for Al+3 of at least 6.70.</p> |
| 申请公布号 |
CA1166507(A) |
申请公布日期 |
1984.05.01 |
| 申请号 |
CA19810374669 |
申请日期 |
1981.04.03 |
| 申请人 |
MINNESOTA MINING AND MANUFACTURING COMPANY |
发明人 |
FISCH, RICHARD S. |
| 分类号 |
H01L21/30;G03F1/08;G03F7/30;G03F7/32;(IPC1-7):G03C5/40 |
主分类号 |
H01L21/30 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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