发明名称 High resistration photomask machine and computerized numerical control system
摘要 A machine and a control system are provided for generating high registration photomasks with a contact printing arrangement. Further, a unique control arrangement is provided for controlling a machine such as a high registration contact print machine or other type of machine. In a preferred embodiment, a control system generates signals to a step and repeat contact printing machine that exposes many prints of master die images on a photographic film, where these prints have a high registration characteristic. In a further embodiment a unique control arrangement is provided for machine control operations.
申请公布号 US4445776(A) 申请公布日期 1984.05.01
申请号 US19800191566 申请日期 1980.09.29
申请人 发明人
分类号 G03F7/20;(IPC1-7):G06F3/16 主分类号 G03F7/20
代理机构 代理人
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