发明名称 Rotatable sputtering apparatus
摘要 A magnetron cathode for sputter-coating non-planar substrates, which includes a rotatable elongated tubular member having a layer of the coating material to be sputtered applied to the outer surface thereof, and magnetic means mounted in said tubular member, said tubular member being contoured longitudinally to provide a non-cylindrical sputtering surface.
申请公布号 US4445997(A) 申请公布日期 1984.05.01
申请号 US19830523969 申请日期 1983.08.17
申请人 SHATTERPROOF GLASS CORPORATION 发明人 MCKELVEY, HAROLD E.
分类号 C23C14/34;H01J37/34;(IPC1-7):C23C15/00 主分类号 C23C14/34
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