| 摘要 |
PURPOSE:To improve UV absorption of quartz and to prevent exposure of unnecessary areas at the time of exposure by incorporating of several ppm of titanium in the quartz used for one of substrates having the active element of a liquid crystal display device. CONSTITUTION:The figure illustrates a glass mask 6, a quartz wafer 7, a photoresist 8, the wafer chuck 9 of an exposure device, and UV rays 10 in a photographing stage using the quartz plate. The UV rays 10 are absorbed with the quartz wafer by incorporating titanium in the quartz, and exposure of unnecessary areas exerted by the reflected rays is prevented. A UV ray cut filter for protecting the liquid crystal is made unnecessary, because the quartz substrate cuts the UV rays. |
