发明名称 |
Pattern detector. |
摘要 |
<p>A pattern detector according to the present invention adopts a processing method wherein means is provided anew with which the intensity distribution of light reflected from or transmitted through an illuminated specimen is photoelectrically converted, and a pattern position is detected at high speed from the ratio between the primary moment and integral value of a detection signal thus derived, whereupon a symmetry calculation is executed within a narrow range around the detected value, whereby the pattern position is found fast and precisely.</p> |
申请公布号 |
EP0106346(A1) |
申请公布日期 |
1984.04.25 |
申请号 |
EP19830110336 |
申请日期 |
1983.10.17 |
申请人 |
HITACHI, LTD. |
发明人 |
TERASAWA, TSUNEO;KUNIYOSHI, SHINJI;TAKANASHI, AKIHIRO;KUROSAKI, TOSHIEI;KAWAMURA, YOSHIO;HOSAKA, SUMIO |
分类号 |
G01B11/00;G03F9/00;G05D3/12;H01L21/027;H01L21/30;(IPC1-7):01B11/00 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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