发明名称 Shaping aperture for a charged particle forming system
摘要 A shaping aperture used in a charged particle forming system and provided with a slit for shaping the cross section of a charged beam emitted is disclosed in which at least two thin plates each provided with a through-hole for passing the charged particle beam therethrough are piled so as to form a shaping slit of a desired form by the through-holes.
申请公布号 US4445040(A) 申请公布日期 1984.04.24
申请号 US19830514352 申请日期 1983.07.18
申请人 HITACHI, LTD. 发明人 IWASAKI, TERUO;SAITOU, NORIO;YANAGISAWA, AKIRA
分类号 H01J37/09;H01L21/027;(IPC1-7):A61K27/02 主分类号 H01J37/09
代理机构 代理人
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