发明名称 |
Shaping aperture for a charged particle forming system |
摘要 |
A shaping aperture used in a charged particle forming system and provided with a slit for shaping the cross section of a charged beam emitted is disclosed in which at least two thin plates each provided with a through-hole for passing the charged particle beam therethrough are piled so as to form a shaping slit of a desired form by the through-holes.
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申请公布号 |
US4445040(A) |
申请公布日期 |
1984.04.24 |
申请号 |
US19830514352 |
申请日期 |
1983.07.18 |
申请人 |
HITACHI, LTD. |
发明人 |
IWASAKI, TERUO;SAITOU, NORIO;YANAGISAWA, AKIRA |
分类号 |
H01J37/09;H01L21/027;(IPC1-7):A61K27/02 |
主分类号 |
H01J37/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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