发明名称 WASHING METHOD FOR CUTTING SURFACE OF WAFER
摘要 <p>PURPOSE:To shorten washing time, and to keep consistency in a process by mechanically expanding the cutting surface arbitrarily and washing it. CONSTITUTION:Kerfs 5 are formed to wafers 3 pasted on an adhesive sheet 2 by a dicing saw, but the wafers on the adhesive sheet 2 are set up on a semicylindrical plate, and the sheet is fixed. Accordingly, the wafers are washed by flowing water or an ultrasonic washer under the state and the cutting surfaces are washed because the kerfs are widened.</p>
申请公布号 JPS5969947(A) 申请公布日期 1984.04.20
申请号 JP19820179816 申请日期 1982.10.15
申请人 HITACHI SEISAKUSHO KK 发明人 MORI RIYUUICHI
分类号 B08B3/12;H01L21/301;H01L21/78 主分类号 B08B3/12
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