发明名称 |
VERFAHREN ZUM HERSTELLEN INTEGRIERTER HALBLEITERSCHALTKREISE |
摘要 |
A method of fabricating an integrated semiconductor circuit device having a plurality of layers of circuit patterns, comprising forming the circuit pattern of at least one of the above mentioned layers by a direct exposure method using an electron beam, and forming the circuit pattern of at least one of the remaining layers by a light exposure method using a photomask. |
申请公布号 |
DE3337300(A1) |
申请公布日期 |
1984.04.19 |
申请号 |
DE19833337300 |
申请日期 |
1983.10.13 |
申请人 |
PIONEER ELECTRONIC CORP. |
发明人 |
SUEMITSU,TAKASHI;NIRIKI,TAKASHI |
分类号 |
G03F7/20;G03F9/00;H01L21/027;H01L21/30;H01L23/544;(IPC1-7):01L21/31;01L21/263;01L21/68;01L21/90;03F9/00;01L21/32 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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