发明名称 High-breakdown-voltage semiconductor device
摘要 A high-breakdown-voltage semiconductor device wherein a resistor body made of a P-type impurity region is disposed in a surface region of an N-type semiconductor body so as to form a resistor element, a P-type low doped region is disposed around the resistor body, and a plate layer which extends from a high potential electrode of the resistor body covers a main part of the P-type low doped region.
申请公布号 US4443812(A) 申请公布日期 1984.04.17
申请号 US19810231285 申请日期 1981.02.04
申请人 HITACHI, LTD. 发明人 IMAIZUMI, ICHIRO;KIMURA, MASATOSHI;OCHI, SHIKAYUKI;YOSHIMURA, MASAYOSHI;YAMAGUCHI, TAKASHI;KODA, TOYOMASA
分类号 H01L21/331;H01L21/768;H01L21/822;H01L23/522;H01L27/04;H01L29/06;H01L29/08;H01L29/40;H01L29/73;H01L29/8605;(IPC1-7):H01L29/44;H01L29/72 主分类号 H01L21/331
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