发明名称 |
High-breakdown-voltage semiconductor device |
摘要 |
A high-breakdown-voltage semiconductor device wherein a resistor body made of a P-type impurity region is disposed in a surface region of an N-type semiconductor body so as to form a resistor element, a P-type low doped region is disposed around the resistor body, and a plate layer which extends from a high potential electrode of the resistor body covers a main part of the P-type low doped region.
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申请公布号 |
US4443812(A) |
申请公布日期 |
1984.04.17 |
申请号 |
US19810231285 |
申请日期 |
1981.02.04 |
申请人 |
HITACHI, LTD. |
发明人 |
IMAIZUMI, ICHIRO;KIMURA, MASATOSHI;OCHI, SHIKAYUKI;YOSHIMURA, MASAYOSHI;YAMAGUCHI, TAKASHI;KODA, TOYOMASA |
分类号 |
H01L21/331;H01L21/768;H01L21/822;H01L23/522;H01L27/04;H01L29/06;H01L29/08;H01L29/40;H01L29/73;H01L29/8605;(IPC1-7):H01L29/44;H01L29/72 |
主分类号 |
H01L21/331 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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