CHEMICAL COMPOSITION FOR PLASMA ETCHING FOR ANISOTROPIC ETC-HING OF SILICON,申请号JP19830122253-传众专利搜索

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发明名称	CHEMICAL COMPOSITION FOR PLASMA ETCHING FOR ANISOTROPIC ETC-HING OF SILICON
摘要
申请公布号	JPS5967635(A)	申请公布日期	1984.04.17
申请号	JP19830122253	申请日期	1983.07.05
申请人	TEXAS INSTRUMENTS INC	发明人	ANDORIYUU JIEI PAADESU
分类号	C01B33/00;C01B33/02;C04B41/91;C23F4/00;H01L21/302;H01L21/3065;H01L21/3213	主分类号	C01B33/00
代理机构		代理人
主权项
地址

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