摘要 |
PURPOSE:To make a hard film of good quality excellent in controllability formable at high speed, by installing a plasma chamber between a sample table of a surface modifying device using an ion beam and a mass separator, while disposing a sample base plate in a plasma atmosphere. CONSTITUTION:Ion beams 3' out of an ion source 1 are mass-separated into only a carbon ion beam by a mass separator 2, then decelerated by a dedelerating electrode 5 of an analytical tube 3 and accumulated on a base plate 6, thus a hard film is made up. At this time, a plasma forming chamber 12 is installed between the decelerating electrode 5 and the base plate 6 and gas is led thereinto, while high-frequency power is fed to a coil 7, producing plasma 13, and the base plate 6 is disposed so as to be exposed to the plasma 13. Therefore, as a radical supply source, the radical content is high in terms of density, and such plasma as capable of exerting no influence upon the beam system is utilized whereby a diamond film of good quality excellent in both controllability and reproducibility can be formed at high speed. |