| 摘要 |
PURPOSE:To obtain a photoresist composition which is cured and colored in a fast color tone easy to discriminate when irradiated with ultraviolet rays or electron beams by blending a photosensitive resin with a photosensitizer and a specified diphenyl-beta-styrylmethane deriv. CONSTITUTION:The desired photoresist composition is obtd. by blending 100pts. wt. photosensitive resin (A) such as urethane acrylate resin or epoxy acrylate resin with about 0.05-20pts.wt. photosensitizer (B) such as benzoin or 2-chloroanthraquinone and about 0.05-15pts.wt. diphenyl-beta-styrylmethane deriv. represented by the formula (where each of R1, R2 and R3 is amino, alkyl, aryl, aralkyl, alkoxy, halogen or H, and each of R4, R5, R6 and R7 is alkoxy, alkyl, allyl, halogen or H). For example, bis(4-dimethylaminophenyl)-beta-styrylmethane is used as the deriv. |
