发明名称 |
Photosensitive composition |
摘要 |
The main photosensitive ingredient of the photosensitive composition is prepared by subjecting a polymer, which is obtained by homopolymerizing, or copolymerizing with another copolymerizable monomer, a monomer of the general formula <IMAGE> in which R represents a hydrogen atom, a halogen atom, or an alkyl group, Y represents a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group, p is 0 or 1, and when p=1, X represents a divalent organic group, to reaction with p-azidocinnamylidene- alpha -cyanoacetic chloride in the presence of an organic or inorganic base.
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申请公布号 |
US4442196(A) |
申请公布日期 |
1984.04.10 |
申请号 |
US19800207087 |
申请日期 |
1980.11.14 |
申请人 |
KONISHIROKU PHOTO INDUSTRY CO., LTD. |
发明人 |
IWAKI, AKIO;KITA, NORIYASU;SASAZAWA, TATSUYA;YAMAGUCHI, HIROYOSHI |
分类号 |
C08F8/00;C08F2/46;C08F8/30;C08F8/32;C08F290/00;C08F299/00;G03F7/012;G03F7/038;H01L21/027;H05K3/00;(IPC1-7):G03C1/52 |
主分类号 |
C08F8/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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