| 摘要 |
PURPOSE:To work an edge chamfer having a precise angle and area, with high yield and in large quantities by masking a part of a slider face of a floating type magnetic head, and etching it by irradiating an ion beam. CONSTITUTION:A slider face of a thin film head 6 is masked with a photoresist 8, is put into a dry etching device, the edge part of the photoresist 8 and the thin film head 6 is etched by irradiating an ion beam, and thereafter, the photoresist 8 is peeled off. The chamfered shape is gently-sloping, and an angle theta and an area S can be controlled precisely by a photoresist shape, and an irradiating angle and an irradiating time of the ion beam. |
