发明名称 DEVELOPING EXPOSED NEGATIVE-WORKING DIAZONIUM SALT LAYERS USING A MIXTURE CONTAINING SALT OF AN ALKANOIC ACID AND A BLOCK COPOLYMER OF ETHYLENE AND PROPYLENE OXIDES
摘要 <p>The invention relates to a developer mixture for developing exposed, light-sensitive reproduction layers which contain a diazonium salt polycondensation product. The mixture comprises water, a salt of an alkanoic acid and a surfactant and contain 0.5 to is percent by weight, in particular 1 to 10 percent by weight, of at least one salt of an alkanoic acid having 8 to 13 carbon atoms and 0.5 to 20 percent by weight, in particular 1 to 12 percent by weight, of at least one low-foaming, nonionic surfactant. These surfactants preferably include optionally modified block polymers formed from ethylene oxide and propylene oxide. The invention also relates to a process for developing negative-working reproduction layers, of the composition indicated above, with the developar mixture according to the invention.</p>
申请公布号 CA1165164(A) 申请公布日期 1984.04.10
申请号 CA19810393309 申请日期 1981.12.29
申请人 HOECHST AKTIENGESELLSCHAFT 发明人 SPRINTSCHNIK, GERHARD
分类号 G03C5/18;G03F7/32;(IPC1-7):G03C5/34 主分类号 G03C5/18
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