发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 PURPOSE:To reduce the demand for the accuracy of laser beam positioning by a method wherein a p-n junction part is irradiated with a laser beam while a breakdown is caused by impressing a reverse directional voltage on the p-n junction. CONSTITUTION:An n<+> layer 2, a p layer 3, and an n<+> layer 4 are successively formed on an SiO2 film 1, the layer 4 is earthed, and the layer 3 is put at the potential of +V. Thereby, the reverse directional voltage is impressed on the n<+>p junction 5, and a forward directional voltage is impressed on the p<+>n junction 6. Then, Joule heat is generated at the junction 5 by causing the breakdown. In this state, the junction 5 is fused by the irradiation of the laser beam. Since the fusion is enabled only by the Joule heat due to the breakdown + laser beam energy, even when the position of the irradiation of the laser beam is out of the target, the fusion does not generate at the place. Therefore, the accuracy of laser beam positioning is not highly demanded.
申请公布号 JPS5961061(A) 申请公布日期 1984.04.07
申请号 JP19820169525 申请日期 1982.09.30
申请人 FUJITSU KK 发明人 NAKANO MOTOO
分类号 G11C17/06;G11C17/14;H01L21/8229;H01L27/10;H01L27/102 主分类号 G11C17/06
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