发明名称 ELECTRON GUN FOR ELECTRON-BEAM EXPOSURE DEVICE
摘要 PURPOSE:To obtain a highly homogeneous electron beam by using as the cathode of an electron gun a columnar or prism-like lanthanum hexaboride member, and irradiating a laser on the bottom surface of the cathode to discharge an electron beam from the surface. CONSTITUTION:In a rectangular electron-beam exposure device, an electron beam sent from a cathode 1 made of lanthanum hexaboride is introduced through a lens 4, slits 5 and 8 having rectangular openings 6 and 9 and a deflector 7 to from an electron beam having an arbitrary shape and size and a rectangular sectional surface 11 before a sample is exposed to the beam. The cathode 1 has a columnar or prism-like shape. After a laser 25 passed through the apertures of an anode 2 and a grid 21 is irradiated upon the bottom surface 1c of the cathode 1, an electron beam discharged from the bottom surface 1c is deflected to obtain the above specified electron beam. As a result, since the flat bottom surface 1c is heated to a given temperature, the homogeneity of the electron beam can be greatly improved.
申请公布号 JPS5960952(A) 申请公布日期 1984.04.07
申请号 JP19820171251 申请日期 1982.09.30
申请人 FUJITSU KK 发明人 YASUDA HIROSHI
分类号 H01J37/06;H01L21/027 主分类号 H01J37/06
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