发明名称 SHUTTER FOR FORMING THIN FILM
摘要 PURPOSE:To provide a titled shutter which prevents the dislodging of the vapor deposition particles sticking on the shutters and to obtain thin films having high quality by the constitution wherein plural sheets of pivotally and rotatably supported shutters for vapor deposition are turned selectively by each sheet to shield the thin film particles. CONSTITUTION:Plural sheets of shutters 3 for vapor deposition consisting of shutter plates 9 and holders 10 are pivotally supported turnably by means of spacers 13 and bearings 11 on a shaft 12 in a vacuum vessel 1 of a thin film forming device. Notches 15, 16 engaging a stopper 17 and a lever 18 are formed to said holders 10, and the shutters 3 are moved upward and downward together with a connecting rod 23 and the shaft 12 by the operation of a feed screw 24 which is rotated with a gear train 26 by the driving of a motor 25; at the same time, the shutters are selectively turned by each sheet by the operation of said lever 18 rotated with a gear train 26 by the driving of a motor 19, whereby the required crucibles 2a,-2f of a vapor source 2 are shielded.
申请公布号 JPS5959881(A) 申请公布日期 1984.04.05
申请号 JP19820168316 申请日期 1982.09.29
申请人 HITACHI SEISAKUSHO KK 发明人 TANAKA MINORU;KUBOTA HITOSHI;AIUCHI SUSUMU
分类号 C23C14/04;C23C14/24 主分类号 C23C14/04
代理机构 代理人
主权项
地址