METHOD FOR PLANARIZING NON-LEVEL SILICON DIOXIDE IN SEMICONDUCTOR DEVICES,申请号EP19810109170-传众专利搜索

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发明名称	METHOD FOR PLANARIZING NON-LEVEL SILICON DIOXIDE IN SEMICONDUCTOR DEVICES
摘要
申请公布号	EP0054164(B1)	申请公布日期	1984.04.04
申请号	EP19810109170	申请日期	1981.10.29
申请人	INTERNATIONAL BUSINESS MACHINES CORPORATION	发明人	ANANTHA, NARASIPUR GUNDAPPA;BHATIA, HARSARAN SINGH;LECHATON, JOHN S.;WALSH, JAMES LEO
分类号	C01B33/12;H01L21/302;H01L21/3065;H01L21/3105;H01L21/311;H01L21/312;H01L21/76;(IPC1-7):01L21/312;01L21/31	主分类号	C01B33/12
代理机构		代理人
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