发明名称 SUBSTRATE FORMING STAMPER
摘要 PURPOSE:To attain a substrate forming stamper having a uniform capability, by providing a specific metallic thin film I , a thin film II consisting of a material which absorbs energy to liberate gas, and specific metallic thin films III and IV in order on a substrate and irradiating the substrate from the side of the film IV with a laser beam to form projecting parts for information recording. CONSTITUTION:A metal such as Ti, Cr, or the like which has a high adhesive strength to a glass substrate 1 is sputtered onto the substrate 1 to form a film 2. A film 3 which has an energy absorbability of a Te50C30N5H15 or the like and has a high gas liberating property of N2, H2 or the like is formed by, for example, sputtering a Te target with mixed gas plasma of CH4 and NH3. A high-hardness Cr film 4 or the like is sputtered, and a metallic film 5 consisting of Au or the like which has a high release property to a resin is formed on the film 4. The substrate 1 is placed on a rotary supporting table 6, and an Ar laser beam 8 is converged by a lens 7 and is irradiated, and continuous or discontinuous projecting parts 9 are formed by partial foaming of the film 3 to record information. Projecting parts 9 are formed uniformly throughout the large-area surface of this substrate, and projecting parts 9 are transferred uniformly to an ultraviolet ray-hardening resin or the like. Thus, a high-quality stamper is attained.
申请公布号 JPS5958640(A) 申请公布日期 1984.04.04
申请号 JP19820168623 申请日期 1982.09.29
申请人 TOSHIBA KK 发明人 TAKEOKA YOSHIKATSU;YASUDA NOBUROU;HORI AKIO;OZAWA NORIO
分类号 G11B7/26;B29C33/00;B29C61/00;B29D17/00;G11B3/70;G11B9/06;G11B23/00 主分类号 G11B7/26
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