发明名称 ELECTRON BEAM EXPOSURE DEVICE
摘要 PURPOSE:To prevent the change of a visual field scanning direction by a method wherein a main deflecter which operates visual field scanning is positioned closer to the specimen than the magnetic focused flux made by a dynamic focus coil and at the same position as the magnetic focused flux made by an object lens or closer to an electron gun than said focused flux. CONSTITUTION:A crossover made by an electron gun 1 is converged by a condensor lens 2 and an object lens 3 and radiated and focused on a target 4. A dynamic focus coil 5 is provided above the object lens 3 to adjust the focus of the electron beam with a high speed and deflecters 6, 7 are provided inside the object lens 3 to scan the electron beam to x-direction and y-direction on the target 4. The main deflecters 6, 7 which operate visual field scanning are provided to approximately the same position as the magnetic focused flux made by the object lens 3 and closer to the specimen than the magnetic focused flux made by the dynamic focus coil 5. With this constitution, the direction of the deflection given by the deflecters 6, 7 is not changed even if the adjustment of the focus is made by changing the exciting current of the coil 5.
申请公布号 JPS5957424(A) 申请公布日期 1984.04.03
申请号 JP19820168803 申请日期 1982.09.28
申请人 TOSHIBA KK 发明人 NAKASUJI MAMORU
分类号 H01J37/14;G03F7/20;H01J37/30;H01J37/305;H01L21/027 主分类号 H01J37/14
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