发明名称 Depletion-type field-effect transistor and method of producing it
摘要 The invention relates to a depletion-type field-effect transistor on a semiconductor body. As high a channel resistance as possible is required to permit its use as a load element. According to the invention, this is achieved in a simple way in that the channel region is longitudinally divided in the source-drain direction so that at least a first subregion (9a, 9b) is present which has a conduction type opposite to the conduction type of the semiconductor body (1) and, next to it, a second subregion (9c) which is of the same conduction type as the semiconductor body (1). The field of application comprises flip-flop circuit load elements, in particular in semiconductor memories. <IMAGE>
申请公布号 DE3235677(A1) 申请公布日期 1984.03.29
申请号 DE19823235677 申请日期 1982.09.27
申请人 SIEMENS AG 发明人 HORNINGER,KARLHEINZ,DR.
分类号 H01L29/78;(IPC1-7):H01L29/78 主分类号 H01L29/78
代理机构 代理人
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