发明名称 PLASMA CVD APPARATUS
摘要 PURPOSE:To improve the productivity by making peripheral apparatus attached to the body of a reaction furnace such as an exhaust system, a system for feeding reactive gas and power sources separable from the body of the furnace and by attaching a means of moving the body of the furnace. CONSTITUTION:An exhaust pump 9, an apparatus 10 for treating exhaust gas, a system 12 for feeding reactive gas, a power source 14, a motor 15, a power source 17 for a heater and a vacuum measuring system 18 attached to the body 1 of a reaction furnace are made separable from the body 1 of the furnace with connecting means 23, 26, 28 and connectors 27, 29 without disturbing the state of the body 1 of the furnace. The body 1 of the furnace can be moved by a moving means 30 independently of the peripheral apparatus.
申请公布号 JPS5953672(A) 申请公布日期 1984.03.28
申请号 JP19820164266 申请日期 1982.09.21
申请人 CANON KK 发明人 KAMIYA OSAMU;FUJIYAMA YASUTOMO
分类号 C23C16/50;G03G5/08;H01L21/205;H01L31/0248 主分类号 C23C16/50
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