发明名称 IMPROVED POSITIVE-WORKING RESIST MATERIALS AND THEIR USE IN A FORMATION OF A NEGATIVE RESIST PATTERN ON A SUBSTRATE
摘要 <p>An improved positive-working resist material capable of forming on a substrate either a positive resist pattern or a negative resist pattern. The positive-working resist material comprises a positive-working resist resin having incorporated therein one or more photochromic compounds, such as spiropyrans, triphenylmethane dyes, anils and the like. A positive or negative resist pattern having a remarkably improved definition can be obtained. The use of such a positive-working resist material in the formation of a negative resist pattern on the substrate is also disclosed.</p>
申请公布号 EP0024916(B1) 申请公布日期 1984.03.28
申请号 EP19800302953 申请日期 1980.08.27
申请人 FUJITSU LIMITED 发明人 CHONAN, TSUNEHIRO;MORISHIGE, AKIRA
分类号 G03F7/038;G03F7/004;G03F7/105;G03F7/20;H01L21/027;(IPC1-7):03F7/26;01L21/47;01L21/312 主分类号 G03F7/038
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