发明名称 |
IMPROVED POSITIVE-WORKING RESIST MATERIALS AND THEIR USE IN A FORMATION OF A NEGATIVE RESIST PATTERN ON A SUBSTRATE |
摘要 |
<p>An improved positive-working resist material capable of forming on a substrate either a positive resist pattern or a negative resist pattern. The positive-working resist material comprises a positive-working resist resin having incorporated therein one or more photochromic compounds, such as spiropyrans, triphenylmethane dyes, anils and the like. A positive or negative resist pattern having a remarkably improved definition can be obtained. The use of such a positive-working resist material in the formation of a negative resist pattern on the substrate is also disclosed.</p> |
申请公布号 |
EP0024916(B1) |
申请公布日期 |
1984.03.28 |
申请号 |
EP19800302953 |
申请日期 |
1980.08.27 |
申请人 |
FUJITSU LIMITED |
发明人 |
CHONAN, TSUNEHIRO;MORISHIGE, AKIRA |
分类号 |
G03F7/038;G03F7/004;G03F7/105;G03F7/20;H01L21/027;(IPC1-7):03F7/26;01L21/47;01L21/312 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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