| 摘要 |
PURPOSE:To visually confirm fluctuation in working and improve working accuracy through re-working etc. by providing a continuous pattern consisting of a pair of the main scale and a specific sub-scale which is in contact therewith. CONSTITUTION:The main scale consisting of the two or more patterns 1, 2 which are spaced by a certain distance is formed. A sub-pattern 3, which is in contact with the main pattern 1, 2 and is overlap with the pattern 1, 2 is within the width of patterns 1,2 is formed for the main scale, an overlap margin of the main patterns 1, 2 and sub-pattern 3 is determined. Thereafter, a working accuracy is measured. Thereby, the area where the over margin of the main patterns 1, 2 and sub-scale pattern 3 becomes 0 has come to have the dimension where the half (1/2) of vernier is side-etched. Accordingly, amount of side etch can be measured visually by disposing a plurality of vernier patterns and working accuracy can be measured quickly. |
