发明名称 CONVEYOR IN PLASMA TREATMENT DEVICE
摘要 PURPOSE:To load and unload quickly and surely a wafer onto and from an electrode and to make foreign matter hardly stickable on the wafer, by providing a means for moving upward and downward the wafer through the electrode and a means for conveying the wafer to above the mounting surface of the electrode. CONSTITUTION:A wafer 5 is set on an arm 10, and a positioning arm 21 is rotated to a position (d), then a pulley 14 is rotated to move a slide block 11 fixing the arm 10 from the position (a) to (b), where the block is stopped. The arm 21 is then rotated from the position (d) to (e), where the face (g) of the block 11 is pressed and positioned to a bearing 22 by means of a spring 26. A pin 36 is moved upward to life the wafer 5 higher than the top surface of the arm 10 by means the pin 36, whereafter the block 11 is returned to the position (a) by the operation reverse from the operation for advancing said block. The pin 36 is lowered and the wafer 5 is set on a high frequency electrode 36, whereby the conveying is completed.
申请公布号 JPS5950169(A) 申请公布日期 1984.03.23
申请号 JP19820161006 申请日期 1982.09.17
申请人 HITACHI SEISAKUSHO KK 发明人 OOTSUBO TOORU;AIUCHI SUSUMU
分类号 C23C16/50;C23C14/56;C23C16/54 主分类号 C23C16/50
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