| 摘要 |
PURPOSE:To obtain a photoreceptor rapidly forming a micropattern on a resist, by dispersing light emitting particles capable of radiating radiation secondarily generated by excitation of the irradiated radiation, into a photosensitive material. CONSTITUTION:The photoreceptor 23 contains the light emitting particles 22 allowed to radiate radiation secondarily by the excitation of the irradiated incident radiation 21. The incident electron beams 21 enter the photoreceptor 23 with the particles 22 dispersed, and lose their energy in passing through the particles 22 and the photoreceptor 23. When the energy is lost in the particles 22, it is consumed as energy for irradiating the secondary radiation 25. When it is lost in the photoreceptor, it is consumed for photochemical reaction, such as decomposition of the resist, or its polymn. 24 represetns a substrate. |
