| 摘要 |
PURPOSE:To shift a color center and to enhance light absorption efficiency, by reducing a content of oxygen in the electrochromic thin film by means of reactive ion plating of a transition metal. CONSTITUTION:Bias voltage is impressed to between a tungsten (W) evaporation source 1 and a substrate 3 in an amt. of oxygen or oxygen and argon or the like inert gas, and electron beams are irradiated on the W source 1 to evaporate it, ionization is accelerated by installing a coil 2 in the middle, and applying high frequency waves, e.g. from a 13.56MHz RF power supply 5 to form plasma, and a thin film is formed on the substrate. WOx deposited on the substrate 3 (0<x< 3) varies in (x) depending on (1) evaporation rate of tungsten, (2) partial pressure of oxygen in an amt., and (3) output of high frequency waves (RF). Light absorption characteristics are enhanced, e.g. by setting said (1) to 0.25nm/sec, and (2) to 8X10<-4>Torr, and (3) to 300W. |
