发明名称 |
Processes for manufacturing double refraction plates and double refraction plates made by such processes. |
摘要 |
<p>In a process for producing a double refraction plate, a transparent dielectric material (23) is directed to and deposited on a substrate (25) obliquely. To control the retardation of the resulting double refraction plate, a polarized light beam having a plane of polarization in a specific direction relative to the substrate (25) is directed onto the substrate (25) through a variable phase plate (33), and the light reflected from the substrate (25) is observed through the variable phase plate (33), as the dielectric material (23) is deposited.</p> |
申请公布号 |
EP0103485(A1) |
申请公布日期 |
1984.03.21 |
申请号 |
EP19830305352 |
申请日期 |
1983.09.13 |
申请人 |
SONY CORPORATION |
发明人 |
MORI, TOSHIO C/O PATENT DEPARTMENT |
分类号 |
G02B1/11;C23C14/22;C23C14/54;G01N21/21;G01N21/23;G02B5/30;(IPC1-7):23C13/04;02B5/30;02B1/10;23C13/06 |
主分类号 |
G02B1/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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