发明名称 TRANSFER MASK
摘要 PURPOSE:To carry out microscopic inspection efficiently without causing electrostatic breakdown, by electrically short-circuiting a pattern with a nontransfer conductive film part on its outside through conductive wires. CONSTITUTION:The conductive film part 1 of the outer circumference of a mask substrate is electrically connected with the conductive film part 2 in its inside for use in transfer through the conductive wires 3 formed on the inside of the part 1, and all the parts 2 arranged along the wires 3 are connected through the wires 3. As a result, charge generated at each part 2 moves to the part 1, and accumulation of the charge and discharge breakdown can be prevented. Since the wires 3 can be used as a scanning coordinate axis at the time of microscopic inspection by arranging each of the wires 3 in parallel to each other at each row of the parts 3, the location of defect occurring at the parts 2 can be detected as a coordinate value, and the microscopic inspection can be carried out efficiently, too.
申请公布号 JPS5948767(A) 申请公布日期 1984.03.21
申请号 JP19820157434 申请日期 1982.09.11
申请人 TOKYO SHIBAURA DENKI KK 发明人 KASAHARA MASAO;SASAGAWA HIROMOTO
分类号 G03F1/00;G03F1/40;G03F1/54;H01L21/027;H01L21/30 主分类号 G03F1/00
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