发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To form a protective film having a superior adhesive strength to the surface of a substrate by adding at least 1 kind of compound selected from a group consisting of monoazaindole and derivs. thereof as an essential component. CONSTITUTION:This composition consists of 0.001-5pts.wt. of at least 1 kind of compound selected from a group consisting of monoazaindole and derivs. thereof, 0.221-5pts.wt. phosphoric acid compound having photopolymerizable unsatd. bond, 20-80pts.wt. photopolymerizable compound having at least one terminal ethylene group, 20-80pts.wt. thermoplastic org. polymer, and 0.5-10pts.wt. sensitizer and/or sensitizer system which initiates the polymn. of the unsatd. compounds when irradiated with active light.
申请公布号 JPS5946642(A) 申请公布日期 1984.03.16
申请号 JP19820157180 申请日期 1982.09.09
申请人 HITACHI KASEI KOGYO KK 发明人 ISHIMARU TOSHIAKI;TSUKADA KATSUSHIGE;HAYASHI NOBUYUKI;SUGASAWA NOBORU
分类号 G03C1/00;C08F2/00;C08F2/48;G03F7/004;G03F7/085;H05K3/28 主分类号 G03C1/00
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