发明名称 RADIAL VANE GAS THROTTLING VALVE FOR VACUUM SYSTEMS
摘要 <p>A gas flow control valve wherein radially disposed vanes (35, 36, 37) are mounted within an annular flange (11) with rotationally mounted shims (25, 26, 27) connecting the radial vanes to the inner peripheral surface (19) of a flange. The shims are disposed in a rim-to-rim configuration with a groove (76) defined in rims of the shims and a cable (86) laid in the grooves in a serpentine pattern. By causing one of the shims (26) to rotate by means of a sealed shaft (59) extending through the flange, the remaining shims may be driven by the cable causing corresponding motion of thevanes. The shims are mounted to the flange by means of pins (74). The shims are relatively thin such that they may be hidden beneath overhanging regions (16, 18) on opposite side walls of the flange, exposing only the radially disposed vanes to a gas flow path. Fine and coarse control modes are achieved by allowing one of the vanes (117) to be controlled by a shaft (107) through the flange independent of all shims for fine mode control and another shaft (101) driving the shims for control of the remaining vanes for coarse mode control. </p>
申请公布号 WO1984001009(A1) 申请公布日期 1984.03.15
申请号 US1982001668 申请日期 1982.11.29
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