发明名称 |
PHOTOSENSITIVE COMPOSITION AND PATTERN-FORMING METHOD |
摘要 |
<p>A photosensitive composition used in forming patterns for colour picture tubes comprises (a) a copolymer of acrylamide and diacetoneacrylamide and (b) a water soluble aromatic bisazide compound. This composition is improved by incorporating a sulfonated vinyl monomer such as sodium-p-styrene-sulfonate in the copolymer. This composition has the advantage that it follows a reciprocal failure law; i.e. the degree of cross linkage of B is related to the intensity i and exposure time t of irradiation by the equation B=f(i.t.<p>) where p is Schwarzschild's constant, which is in the range O<p<1 and preferably O<p<0.76. The development time of this composition after exposure is also shorter than that of prior art compositions.</p> |
申请公布号 |
EP0028486(B1) |
申请公布日期 |
1984.03.14 |
申请号 |
EP19800303760 |
申请日期 |
1980.10.23 |
申请人 |
HITACHI, LTD. |
发明人 |
HAYASHI, NOBUAKI;AKAGI, MOTOO;MIURA, KIYOSHI;ODAKA, YOSHIYUKI |
分类号 |
H01J29/20;G03F7/012;H01J29/22;(IPC1-7):03C1/70;03F7/08 |
主分类号 |
H01J29/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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