发明名称 PHOTOSENSITIVE COMPOSITION AND PATTERN-FORMING METHOD
摘要 <p>A photosensitive composition used in forming patterns for colour picture tubes comprises (a) a copolymer of acrylamide and diacetoneacrylamide and (b) a water soluble aromatic bisazide compound. This composition is improved by incorporating a sulfonated vinyl monomer such as sodium-p-styrene-sulfonate in the copolymer. This composition has the advantage that it follows a reciprocal failure law; i.e. the degree of cross linkage of B is related to the intensity i and exposure time t of irradiation by the equation B=f(i.t.<p>) where p is Schwarzschild's constant, which is in the range O<p<1 and preferably O<p<0.76. The development time of this composition after exposure is also shorter than that of prior art compositions.</p>
申请公布号 EP0028486(B1) 申请公布日期 1984.03.14
申请号 EP19800303760 申请日期 1980.10.23
申请人 HITACHI, LTD. 发明人 HAYASHI, NOBUAKI;AKAGI, MOTOO;MIURA, KIYOSHI;ODAKA, YOSHIYUKI
分类号 H01J29/20;G03F7/012;H01J29/22;(IPC1-7):03C1/70;03F7/08 主分类号 H01J29/20
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