发明名称 VAPOR DEPOSITING METHOD
摘要 PURPOSE:To form stably a photosensitive film for electrophotography or the like having uniform concn. by vapor deposition, by specifying the specific volatility among the component elements of alloys which are materials to be evaporated. CONSTITUTION:Vapor deposition is accomplished under the condition wherein the specific volatility among component elements of alloys such as Se-Te, Se-S, Fe-Ni or the like to be used as a material to be evaporated in the stage of forming a photosensitive film, etc. is specified at 0.9-1.1. The vapor having substantially the same compsn. ratio as the compsn. ratio of the alloys can be generated under such condition and the component ratio of the vapor deposition film to be deposited on a substrate is made roughly constant. The vapor pressure ratio at the vapor deposition temp. between the respective component elements of the alloy in this method is maintained preferably at about 10:1 or above and the content of the element indicating the lower vapor pressure at about <=7wt%. A photosensitive film wherein the fluctuation of the content of Te in the part covering at least 10mum length in, for example, the film thickness direction is within about 0.5%, is obtd. by the above-mentioned method.
申请公布号 JPS5943866(A) 申请公布日期 1984.03.12
申请号 JP19820154231 申请日期 1982.09.04
申请人 KONISHIROKU SHASHIN KOGYO KK 发明人 NISHIWAKI AKIRA;MORIGUCHI HIROYUKI;NOMORI HIROYUKI;ITOU KUNIO
分类号 C23C14/00;C23C14/06;C23C14/24;G03G5/082;H01L21/203;H01L31/0248 主分类号 C23C14/00
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