PHOTO, E-BEAM, AND X-RAY SENSITIVE NEGATIVE RESISTS BASED ON DONOR POLYMER-DOPED HALOCARBON ACCEPTOR TRANSFER COMPLEXES AND METHOD FOR PRODUCING NEGATIVE RESIST IMAGES

摘要

A new class of photo, E-beam and X-ray resists is described. The resists are donor polymer doped halocarbon acceptor transfer complexes. They are prepared from known polymeric backbones such as polyvinylchloride, polyglutamic acid, polyvinylbenzylchloride, polyepichlorohydrin, poly( alpha halophosphazenes), polyacrylic chloride, polystyrene and the like; and donor molecules such as tetrathiafulvalenes, tetraselenafulvalenes, dithiadiselenafulvalene, tetrathiatetracene, ferrocenes, phenothiazines, pyrazoline and an amine having the general formula R-NH2 where R can be selected from alkyl and or aryl groups. The donor molecule is capable of forming a salt in the presence of actinic, E-beam or X-ray radiation with a halocarbon acceptor. A method for producing negative resist images is also described.